Save. Share. Connect.
Thursday, October 27, 2016
VOLUME -27 NUMBER 5
Publication Date: 05/1/2012
Front Page News
People in the News
Electronic Mfg. Services
Electronic Mfg. Products
Special Features: Components and Distribution
Multi Tradeshow Product Preview
May 2012 Issue
Add Message Board
Steamer Enables Much Faster Thin Film Production
San Diego, CA — The RASIRC Steamer, which has closed loop flow control, purifies and delivers ultrapure liquids and gases, including ultra-high-purity (UHP) steam from de-ionized water. The company's dryers, humidifiers, and steam generators are used in critical applications in the semiconductor, pharmaceutical, medical, biological, fuel cell, and power industries.
The results of a recent study show that uniform thin oxides of 1,000 Å can be grown more than 5X faster using wet thermal oxidation process instead of dry oxidation. The study, conducted by customer WRS Materials, compared growth rate and uniformity of 1,000 Å oxide film produced by dry versus wet oxidation using a RASIRC Steamer. WRS Materials was able to obtain an 87 percent improvement in throughput while maintaining uniformity comparable with dry oxidation.
According to a RASIRC company spokesperson, 3,000 and 5,000 Å films are typically grown with steam, whereas 1,000 Å processes typically use dry oxidation to achieve the desired uniformity.
Contact: RASIRC, 7815 Silverton Avenue, San Diego, CA 92126
858-259-1220 E-mail: email@example.com Web:
© 2015 USTECH. All Rights Reserved. |
Contact Us: 610-783-6100 | firstname.lastname@example.org
powered by GIM