Rolla, MO — Brewer Science is reportedly pushing the limits of patterning technology and process flexibility with the next generation of its OptiStack® system of products.
|Multilayers with negative tone development (left) and (left) and positive tone development (right). |
By providing materials that have variable optical properties and can work across multiple wavelengths, the OptiStack system of products offers customers advantages over other multilayer systems by providing versatility regardless of the substrate or patterning technology. This adaptability gives semiconductor device manufacturers the advantage of being able to implement existing lithography equipment for newer technology nodes while decreasing the implementation time of new patterning technologies, which provides significant equipment and process cost savings.
Material development to support patterning at any feature size with OptiStack multilayer system products includes: materials that will extend the useful life of existing KrF, ArF, and ArF immersion lithography equipment; materials for use in NTD processes; EUV assist layers for dose reduction and pattern transfer; DSA substrates and pattern transfer layers.
Contact Brewer Science, Inc., 2401 Brewer Drive, Rolla, MO 65401 573-364-0300 fax: 573-368-3318 Web: http://www.brewerscience.com