Carson City, NV — Plasma Etch has introduced a new plasma system that incorporates two individual plasma etching/cleaning type/mode technologies into one complete standalone plasma etching/cleaning system. Called the PE-100 Convertible, it gives the user the ability to switch back and forth between RIE anisotropic type etching mode applications and isotropic type etching/cleaning mode applications. Traditionally, two separate standalone plasma systems had been needed to achieve this capability.
|Dual-function plasma etching system. |
The PE-100 Convertible system is used for R&D, medical devices, solar cells, optics, printed circuit boards, MEMs, nanotechnology, life sciences, wafer level packaging, and laboratory applications as well as many other related semiconductor processes.
Contact: Plasma Etch, Inc., 3522 Arrowhead Drive, Carson City, NV 89706 775-883-1336 E-mail: email@example.com Web: http://www.plasmaetch.com