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Tuesday, May 24, 2016
VOLUME -25 NUMBER 9
Publication Date: 09/1/2010
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September 2010 Issue
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Gore Intros Family of Cartridge Filters
Elkton, MD, — W. L. Gore & Associates, Inc. (Gore) is offering a new family of highly efficient cartridge filters that improve water quality and reduce total cost of filtration for ultrapure water (UPW) and de-ionized (DI) water used in the manufacture of semiconductors and silicon wafers.
Gore has used its expertise in ePTFE materials and membrane technology to engineer a family of filters that offer 3x the flow rate of best-in-class filters without sacrificing particle retention, and that can be easily substituted for filters in the field that no longer meet performance or cost requirements. They also can provide a more economical alternative to ultrafiltration (UF) modules.
Applications include a US semiconductor fab that replaced its Nylon pre-filters with GORE
0.01µm filters in its UPW facility. The high flow rate of the company's filters enabled the manufacturer to replace 840 10-in. equivalents with only 210, reducing their total cost of filtration by more than 50 percent.
TSMC Shanghai has demonstrated that the Gore HR (high retention) filters provide a significantly lower-cost alternative (50 percent less capital expenditure) to ultrafiltration modules and will meet the needs for most ultrapure water systems.
A major semiconductor manufacturer in Asia has replaced a large-pore-size guard filter with Gore 0.1µm filters — instead of installing an additional skid of expensive UF filters — to address periodic water quality problems, provide protection against system upsets, and reduce baseline counts during normal operations. The filters incorporate the company's proprietary high-flow ePTFE (expanded polytetrafluoroethylene) filtration media, used for decades in semiconductor, electronics, high-purity chemical and pharmaceutical applications.
Contact: W.L. Gore & Associates, Inc., 402 Vieve's Way, Elkton, MD 21922
800-445-4673 or 410-392-4100 fax: 410-392-9628 Web:
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