The PlasmaPro 100 Sapphire is an evolution in single wafer etch technology.
With extensive experience of etching all HBLED related materials, our technologies enable the cost of ownership and yield required to maximise the performance of your devices.
The PlasmaPro 100 Sapphire single wafer etch system offers smart solutions to produce the etch results you need to maintain your competitive edge.
Key system features and benefits include:
- Actively cooled electrode to maintain sample temperature during etch process
- High power ICP source producing high density plasmas
- Magnetic spacer for enhanced ion control and uniformity
- High conductance pumping system
- Reliable hardware and ease of serviceability for excellent uptime
Designed specifically for the harsh chemistries required for HBLED materials, the PlasmaPro 100 Sapphire delivers fast etch rates uniformly on wafers up to 200mm diameter. Above all it has been developed with reliability, uptime and ease of serviceability in mind.
Exclusive Electrostatic Clamp technology capable of clamping:
- GaN on Sapphire